SPECTROSCOPY OF HALOGEN AMINE SYSTEMS: DISCHARGE FLOW METHODS AND LOW TEMPERATURE MATRIX ISOLATION
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Date
1994
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Journal ISSN
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Publisher
Ohio State University
Abstract
The excited electronic states of the halogen amines and of the halogen aminyl radicals are being probed by a combination of discharge flow methods, excimer laser photolysis, and low temperature matrix isolation. In studies carried out by Zhao and $Setser^{1}$, when $PF_{3}$was add to a stream of argon metastables, emission assigned to the $PF_{2}$ radical was observed. This method was explored as a way to generate $NX_{2}$ radicals from the parent halogen amine. When $NFCl_{2}$ is added to a stream of argon metastables, however, $NCl(b^{1}\Delta \rightarrow X^{3}\Sigma^{+}), NF(b^{1}\Delta \rightarrow X^{3}\Sigma^{+})$ and $Cl_{2}(D^{+}\rightarrow A^{\prime})$ emission is obseved. These results are compared to excimer laser photolysis studie carries carried out previously in our $laboratory^{2}$. Information about the electronic states of NFCl radicals obtained from LIF studies of NFCl I low temperature matrices will also be presented.
Description
1. Y. Zhao and D. W. Setser, Chem. Phys. Lett., 210, 362 (1993). 2. D. B. Exton. S. A. Williams and J. V. Gilbert, J. Phys Chem., 97, 4326 (1993).
Author Institution: Department of Chemistry, University of Denver
Author Institution: Department of Chemistry, University of Denver