INFRARED SPECTROSCOPY AND PHOTOCHEMISTRY OF NITROMETHANE ADSORBED ON ALKALI HALIDE FILMS
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Date
1996
Journal Title
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Publisher
Ohio State University
Abstract
Nitromethane ($CH_{3}NO_{2}$) was adsorbed at low temperature onto films of sublimated alkali halides. Assignment of the infrared spectrum of the adsorbed species is consistent with physisorption, as are thermal desorption isotherms (desorption activation energies of 26-32 kJ $mol^{-1}$). The photochemistry of the adsorbate is sensitive to surface temperature and wavelength of irradiation. None of the primary products of gas phase photolysis ($CH_{2}O$, HNO, $CH_{3}NO$, O, $CH_{3}$, $NO_{2}$) were observed, although traces of methyl nitrite ($CH_{3}ONO$) were observed .The appearance of species such as HNCO and CO as a result of irradiation indicates that fragment migration and rephotolysis may play a major role in these reactions.
Description
Author Institution: Department of Chemistry, University of Scranton