INFRARED SPECTRUM AND PHOTOCHEMISTRY OF ADSORBED $CF_{3}NO_{2}$
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Date
1993
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Ohio State University
Abstract
Submonolayer coverages of trifluoronitromethane ($CF_{3}NO_{2}$) were adsorbed onto alkali halide (NaCl, KCl, KBr, and NaBr) films. The infrared spectrum of the adsorbate was acquired and compared to the gas phase spectrum: the C-F stretching fundamentals are shifted strongly to the red, while the N-O stretching fundamentals are only weakly shifted. Upon UV irradiation (250-350 nm), the adsorbed $CF_{3}NO_{2}$ is diminished, and spectra attributed to $CF2O$ and FNO appear. The effect of temperature and substrate on this photochemical process will be discussed.
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Author Institution: Sun Chemical Corporation; Department of Chemistry, University of Scranton