PHOTOCHEMISTRY OF TRIFLUORONITROSOMETHANE $(CF_{3}NO)$ ADSORBED ON NOBLE GAS SOLIDS

Abstract

Submonolayer and multilayer coverages of $CF_{3}NO$ on solid argon, krypton and xenon films were irradiated in the 633-670 nm region. Infrared spectra of the sample following this irradiation indicate the presence of the $(CF_{3})_{2}NONO$ dimer observed by $Mason^{1}$. This dimer is formed as the result of dissociation of the $S_{1} CF_{3}NO$ and migration of the nascent radicals to adjacent occupied surface sites. The temperature dependence of the quantum efficiency of this process indicates that both geminate recombination and surface translation (followed by dimer formation) are occurring.