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dc.creatorChollet, P.en_US
dc.creatorGuelachvili, G.en_US
dc.creatorMorillon-Chapey, M.en_US
dc.creatorGressier, P.en_US
dc.creatorDe Rosny, G.en_US
dc.creatorSchmitt, J.en_US
dc.date.accessioned2006-06-15T14:49:33Z
dc.date.available2006-06-15T14:49:33Z
dc.date.issued1983en_US
dc.identifier1983-TA-06en_US
dc.identifier.urihttp://hdl.handle.net/1811/11945
dc.descriptionAuthor Institution: Laboratoire d'Infrarouge, Universit\'e de Paris-Sud B\hat{a}timent 350; Laboratoire d'Infrarouge, Equipe de Synth\'ese des Couches Minces pour l'Energ\'etique L.P.N.H.E.en_US
dc.description.abstractA preliminary experiment of high resolution absorption and emission spectroscopy of a silane plasma in the $1800-2300 cm^{-1}$ range has been previously reported 1 . The detection of the 1-0 band of the free radical SiH, at $2000 cm^{-1}$ was then obtained with a poor signal-to-noise ratio. In order to increase the sensitivity of the detection a new experimental set-up has been built. The $SiH_{4}$ plasma is observed in a 2.5 m long source containing a White-type multi-reflexion system. The spectra are recorded with the Fourier transform interferometer of Laboratoire d’Infrarouge, with a simultaneous control the conditions of the excitation of the plasma. Description of the experimental system, and preliminary results are given. $^{1}$J.C. Knights, J.P.M Schmitt, J. Perrin and C. Guelachvili, J. Chem . Phys., 76, p.3414-3421 (1982).en_US
dc.format.extent84563 bytes
dc.format.mimetypeimage/jpeg
dc.language.isoEnglishen_US
dc.publisherOhio State Universityen_US
dc.titleOBSERVATION OF INFRARED SiH in a $SiH_{4}$ PLASMAen_US
dc.typearticleen_US


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