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dc.creatorDonnelly, V. M.en_US
dc.creatorMcDonald, J. R.en_US
dc.creatorBaronavski, A. P.en_US
dc.date.accessioned2006-06-15T14:09:17Z
dc.date.available2006-06-15T14:09:17Z
dc.date.issued1978en_US
dc.identifier1978-WG-09en_US
dc.identifier.urihttp://hdl.handle.net/1811/10719
dc.description$^{1}$ H. Okabe and M. Lenzi, J. Chem. Phys. 47, 5241 (1967). $^{2}$ J. Masamet, A. Gilles, and C. Vermeil, J. Photochem., 3, 417 (1974/1975). $^{3}$ K. Dressler and D. A. Ramsay, Phil. Trans. Roy. Soc. London 251, 553 (1959). $^{4}$ J.W.C. Johns, D. A. Ramsay, Can. J. phys. 54, 1804 (1976). V. M. Donnelly has been a NRC/NRL Resident Research Associate.""en_US
dc.descriptionAuthor Institution: Naval Research Laboratoryen_US
dc.description.abstractLow pressure ($P < 35$ mtorr) samples of $NH_{3}$ are photolyzed with a Tachisto Model XR 150 pulsed excimer laser operating on the 193 nm line of ArF (20 nsec pulse duration, 35 mJ per pulse, $\sim 3$ Hz repetition rate). Contrary to previous $^findings^{1,2}$ (for $NH_{3}$ dissociation) in this excitation region, we find that $NH_{2} (A^{2}A_{1})$ is a major product formed by single photon, primary photolysis. Strong $NH_{2} (A^{2} A_{1} \rightarrow X^{2}B_{1})$ banded emission is observed between 620 and 1100 nm. Most of the lines are assignable to transitions catalogued in absorption by Dressier and $Ramsay^{3}$ and Johns, Ramsay, and $Ross^{4}$ The relative intensities in our emission experiments are much different than those in absorption, indicating that much of the 0.74 eV excess dissociation energy appears as bending vibrational energy and rotational excitation about the a-axis. These observations are expected, an the basis of changes in geometry in the primary photolysis process. Experiments are also under way to probe energy distributions with the $NH_{2} (X^{2}B_{1})$ primary photofragment, Using dye laser-induced fluorescence excitation spectroscopy on the $A^{2}A_{1}\leftarrow X_{2} B_{1}$ transition. In addition, $NH(A^{3}\Pi)$ is formed in a two photon $NH_{3}$ dissociation process, giving rise to a $A^{3} \Pi\rightarrow X^{3} \Sigma^{-}$ emission at 336 nm.en_US
dc.format.extent181119 bytes
dc.format.mimetypeimage/jpeg
dc.language.isoEnglishen_US
dc.publisherOhio State Universityen_US
dc.titleArF EXCIMER LASER PHOTODISSOCIATION OF $NH_{3}$: INTERNAL ENERGY DISTRIBUTION IN $NH_{2}$ $A_{2}A$, AND $X_{2}B_{1}$en_US
dc.typearticleen_US


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