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M-H BOND DISTANCES IN SILANES AND GERMANES

Please use this identifier to cite or link to this item: http://hdl.handle.net/1811/7260

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Title: M-H BOND DISTANCES IN SILANES AND GERMANES
Creators: Lindeman, Louis P.; Polo, S. R.; Wilson, M. Kent
Issue Date: 1954
Abstract: The rotational structure of the Si-D stretching fundamental in $SiH_{3}D$, the Ge-D stretching vibration in $GeH_{3}D$, and the Ge-H stretching mode in $GeHD_{3}$ have been studied under prism dispersion. Under assumptions of tetrahedral angles and no change in bond length due to isotopic substitution, the following interatomic distances are obtained: {d}_{{Si}-{H}}=1.47_{7}\pm 0.003{A}\qquad {in SiH}_{3}{D}{d}_{{Ge}-{H}}=1.52_{9}\pm 0.003{A}\qquad {in GeH}_{3}{D}{d}_{{Ge}-{H}}=1.52_{5}\pm 0.005{A}\qquad {in HeHD}_{3}
URI: http://hdl.handle.net/1811/7260
Other Identifiers: 1954-G-3
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