Corrosion Inhibition of Cobalt with a Thin Film of Cu-BTA

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dc.creator Brusic, V.
dc.creator Frankel, G. S.
dc.creator Schrott, A. G.
dc.creator Petersen, T. A.
dc.creator Rush, B. M. 2010-01-05T16:06:50Z 2010-01-05T16:06:50Z 1993
dc.identifier.citation Brusic, V.; Frankel, G. S.; Schrott, A. G.; Petersen, T. A. "Corrosion Inhibition of Cobalt with a Thin Film of Cu-BTA," Journal of the Electrochemical Society, v. 140, no. 9, 1993, pp. 2507-2511. en_US
dc.identifier.issn 0013-4651 (print)
dc.description.abstract Electrochemical techniques, ellipsometry and x-ray photoelectron spectroscopy were used to evaluate the use of benzotriazole, alone or in combination with boric acid/borate buffer and dilute copper sulfate for the protection of cobalt. The data indicate that in slightly alkaline solutions benzotriazole is a strong inhibitor for cobalt corrosion, whereas in water and neutral solutions it produces a barely measurable effect. In the presence of benzotriazole and Cu^+2 ions, spontaneous reduction of copper ions leads to the formation of a thin film of Cu-BTA on the cobalt surface. This film acts as a corrosion protector that is better than benzotriazole, with a significant reduction of the corrosion rate even during subsequent exposure to solutions without inhibitors. en_US
dc.language.iso en_US en_US
dc.subject cobalt corrosion en_US
dc.subject benzotriazole en_US
dc.subject thin film en_US
dc.title Corrosion Inhibition of Cobalt with a Thin Film of Cu-BTA en_US
dc.type Article en_US
dc.identifier.doi 10.1149/1.2220852 Attribution-ShareAlike 3.0 Unported en_US
dc.rights.ccuri en_US
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